DocumentCode
958968
Title
Nucleation and control of departure of a high-field domain by a gate electrode
Author
Hashizume, Nobuya ; Kawashima, Mitsumasa ; Kataoka, S.
Author_Institution
Ministry of International Trade & Industry, Electrotechnical Laboratory, Tokyo, Japan
Volume
7
Issue
8
fYear
1971
Firstpage
195
Lastpage
197
Abstract
Experimental results are given which show that, in a m.i.s.f.e.t. type GaAs bulk device, a negative voltage applied to the gate electrode can nucleate a high-field domain under the gate electrode, but that its subsequent departure for the anode is allowed or inhibited depending on the device structure and operating conditions.
Keywords
field effect transistors; metal-insulator-semiconductor devices; FET; GaAs bulk device; MIS devices; gate electrode; high field domain departure nucleation and control;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19710130
Filename
4244380
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