• DocumentCode
    958968
  • Title

    Nucleation and control of departure of a high-field domain by a gate electrode

  • Author

    Hashizume, Nobuya ; Kawashima, Mitsumasa ; Kataoka, S.

  • Author_Institution
    Ministry of International Trade & Industry, Electrotechnical Laboratory, Tokyo, Japan
  • Volume
    7
  • Issue
    8
  • fYear
    1971
  • Firstpage
    195
  • Lastpage
    197
  • Abstract
    Experimental results are given which show that, in a m.i.s.f.e.t. type GaAs bulk device, a negative voltage applied to the gate electrode can nucleate a high-field domain under the gate electrode, but that its subsequent departure for the anode is allowed or inhibited depending on the device structure and operating conditions.
  • Keywords
    field effect transistors; metal-insulator-semiconductor devices; FET; GaAs bulk device; MIS devices; gate electrode; high field domain departure nucleation and control;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19710130
  • Filename
    4244380