• DocumentCode
    960137
  • Title

    AlGaAs/GaAs Pnp HBT with 54 GHz fmax and application to high-performance complementary technology

  • Author

    Kim, T.S. ; Tserng, Hua-Quen

  • Volume
    40
  • Issue
    11
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    2113
  • Abstract
    Summary form only given. A self-aligned AlGaAs/GaAs Pnp HBT (heterojunction bipolar transistor) with a maximum frequency of oscillation of 54 GHz is reported. Improvements in device speed over previous work were obtained by optimization of epitaxial structure and reduction of base contact resistance. The PnP epitaxial structure was grown by nonarsine MOVPE (metal-organic vapor-phase epitaxy), with silicon and carbon as the donor and acceptor dopants. The Pnp HBT epitaxial structure was incorporated into recessed areas in wafers with a previously grown Npn HBT epi structure, and the two device types were fabricated simultaneously. Pnp and Npn devices on a single wafer achieved fmax of 50 and 90 GHz, respectively
  • Keywords
    III-V semiconductors; aluminium compounds; bipolar integrated circuits; gallium arsenide; heterojunction bipolar transistors; solid-state microwave devices; vapour phase epitaxial growth; 54 GHz; 90 GHz; AlGaAs-GaAs; HBT; Pnp device; base contact resistance; epitaxial structure; heterojunction bipolar transistor; high-performance complementary technology; metal-organic vapor-phase epitaxy; nonarsine MOVPE; p-n-p device; recessed areas; self-aligned; Bridges; Contact resistance; Electronic ballasts; Gallium arsenide; Heterojunction bipolar transistors; Lenses; Resistors; Thermal force; Thermal lensing; Thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.239784
  • Filename
    239784