DocumentCode
960137
Title
AlGaAs/GaAs Pnp HBT with 54 GHz f max and application to high-performance complementary technology
Author
Kim, T.S. ; Tserng, Hua-Quen
Volume
40
Issue
11
fYear
1993
fDate
11/1/1993 12:00:00 AM
Firstpage
2113
Abstract
Summary form only given. A self-aligned AlGaAs/GaAs Pnp HBT (heterojunction bipolar transistor) with a maximum frequency of oscillation of 54 GHz is reported. Improvements in device speed over previous work were obtained by optimization of epitaxial structure and reduction of base contact resistance. The PnP epitaxial structure was grown by nonarsine MOVPE (metal-organic vapor-phase epitaxy), with silicon and carbon as the donor and acceptor dopants. The Pnp HBT epitaxial structure was incorporated into recessed areas in wafers with a previously grown Npn HBT epi structure, and the two device types were fabricated simultaneously. Pnp and Npn devices on a single wafer achieved f max of 50 and 90 GHz, respectively
Keywords
III-V semiconductors; aluminium compounds; bipolar integrated circuits; gallium arsenide; heterojunction bipolar transistors; solid-state microwave devices; vapour phase epitaxial growth; 54 GHz; 90 GHz; AlGaAs-GaAs; HBT; Pnp device; base contact resistance; epitaxial structure; heterojunction bipolar transistor; high-performance complementary technology; metal-organic vapor-phase epitaxy; nonarsine MOVPE; p-n-p device; recessed areas; self-aligned; Bridges; Contact resistance; Electronic ballasts; Gallium arsenide; Heterojunction bipolar transistors; Lenses; Resistors; Thermal force; Thermal lensing; Thermal resistance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.239784
Filename
239784
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