• DocumentCode
    960399
  • Title

    Demonstrating the potential of 6-H silicon carbide for power devices

  • Author

    Palmour, John W. ; Edmond, J.A.

  • Author_Institution
    Cree Res. Inc., Durham, NC
  • Volume
    40
  • Issue
    11
  • fYear
    1993
  • fDate
    11/1/1993 12:00:00 AM
  • Firstpage
    2129
  • Lastpage
    2130
  • Abstract
    Summary form only given. Discusses the first vertical UMOS power MOSFETs ever reported in SiC, shows the highest gain 6H-SiC BJTs (bipolar junction transistors) and thyristors ever reported, and demonstrate the high-temperature operation of these devices. Vertical power MOSFETs fabricated in 6H-SiC with a UMOS design have specific on-resistances as low as 38 mΩ-cm2 at a gate bias of +12 V. These devices can have current densities as high as 190 A/cm2 (0.32 A/cm of gate periphery) and can dissipate a maximum power density of 5.4 kW/cm2. SiC BJTs have been demonstrated up to 400°C. The device structure used a reactive ion etched emitter with sintered Ni contacts to both the emitter and collector, and Al/Ti alloy contacts to the base. Four-layer structures have also been demonstrated in 6H-SiC, with p-n-p-n thyristors showing 100 V operation
  • Keywords
    bipolar transistors; carrier density; insulated gate field effect transistors; semiconductor materials; silicon compounds; sputter etching; thyristors; 100 V; 400 degC; BJTs; SiC; current densities; four-layer structures; gate bias; high-temperature operation; maximum power density; on-resistances; p-n-p-n thyristors; reactive ion etched emitter; thyristors; vertical UMOS power MOSFETs; Conductivity; Current density; Epitaxial layers; MOSFETs; Photonic band gap; Rectifiers; Silicon carbide; Temperature; Thyristors; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.239810
  • Filename
    239810