• DocumentCode
    961444
  • Title

    Industrial Ion Implantation Machines

  • Author

    Ryding, Geoffrey ; Wittkower, Andrew B.

  • Author_Institution
    Extrion Corp,Gloucester, Mass
  • Volume
    4
  • Issue
    1
  • fYear
    1975
  • fDate
    9/1/1975 12:00:00 AM
  • Firstpage
    21
  • Lastpage
    31
  • Abstract
    In the last few years the use of small accelerators for ion implantation has been firmly established as an important manufacturing process in the fabrication of microelectronic devices and circuits. Before 1968 the only machines available for implantation were those designed originally for nuclear research, isotope separation, or neutron generation and adapted for implantation purposes. Since then, equipment has evolved to meet the specific needs of commercial applications. This paper discusses certain accelerator components where the changes have been most pronounced.
  • Keywords
    Ion accelerators; Ion implantation; Circuits; Fabrication; Ion accelerators; Ion implantation; Isotopes; Manufacturing industries; Manufacturing processes; Microelectronics; Neutrons; Nuclear power generation;
  • fLanguage
    English
  • Journal_Title
    Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0046-838X
  • Type

    jour

  • DOI
    10.1109/TMFT.1975.1135858
  • Filename
    1135858