DocumentCode
961444
Title
Industrial Ion Implantation Machines
Author
Ryding, Geoffrey ; Wittkower, Andrew B.
Author_Institution
Extrion Corp,Gloucester, Mass
Volume
4
Issue
1
fYear
1975
fDate
9/1/1975 12:00:00 AM
Firstpage
21
Lastpage
31
Abstract
In the last few years the use of small accelerators for ion implantation has been firmly established as an important manufacturing process in the fabrication of microelectronic devices and circuits. Before 1968 the only machines available for implantation were those designed originally for nuclear research, isotope separation, or neutron generation and adapted for implantation purposes. Since then, equipment has evolved to meet the specific needs of commercial applications. This paper discusses certain accelerator components where the changes have been most pronounced.
Keywords
Ion accelerators; Ion implantation; Circuits; Fabrication; Ion accelerators; Ion implantation; Isotopes; Manufacturing industries; Manufacturing processes; Microelectronics; Neutrons; Nuclear power generation;
fLanguage
English
Journal_Title
Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0046-838X
Type
jour
DOI
10.1109/TMFT.1975.1135858
Filename
1135858
Link To Document