DocumentCode
962124
Title
Laser Processing in Silicon Microelectronics Technology
Author
Leamy, H.J.
Author_Institution
Bell Laboratories, Murray Hill, NJ, USA
Volume
5
Issue
1
fYear
1982
fDate
3/1/1982 12:00:00 AM
Firstpage
112
Lastpage
117
Abstract
Laser irradiation may effect either thermal or chemical changes in target materials. A brief review of the mechanisms involved and a summary assessment of their potential for application in silicon microelectronics technology is presented.
Keywords
Integrated circuit fabrication; Laser applications, materials processing; Silicon materials/devices; Chemical lasers; Chemical technology; Electron beams; Integrated circuit technology; Laser beam cutting; Laser beams; Microelectronics; Optical materials; Silicon; Temperature;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/TCHMT.1982.1135928
Filename
1135928
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