DocumentCode
962143
Title
Device Modeling for Submicron FET Integrated Circuits
Author
Chatterjee, Pallab K.
Author_Institution
Texas Instruments, Inc., Dallas, TX, USA
Volume
5
Issue
1
fYear
1982
fDate
3/1/1982 12:00:00 AM
Firstpage
122
Lastpage
126
Abstract
Phys!cal understanding of submicron device phenomena is key to the efficient use of these structures in circuit applications and to the invention of new device structures and concepts. Modeling activities are categorized in hierarchical levels of abstraction which extends the concept of hierarchical system simulation down to the fundamental levels of process modeling. Major emphasis in field-effect transistor (FET) modeling beyond the micron dimension is on the incorporation of geometry effects and high field transport on active devices. As geometry sizes shrink, the effects of both carrier types become important even in unipolar devices. For very large-scale integrated (VLSI) circuits at these geometries modeling of parasitic devices like interconnections and isolation are important in determining circuit operation and performance.
Keywords
FET integrated circuits; Circuit simulation; FET integrated circuits; Fabrication; Geometry; Integrated circuit modeling; Poisson equations; Semiconductor process modeling; Silicon; Solid modeling; Very large scale integration;
fLanguage
English
Journal_Title
Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
Publisher
ieee
ISSN
0148-6411
Type
jour
DOI
10.1109/TCHMT.1982.1135930
Filename
1135930
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