• DocumentCode
    962143
  • Title

    Device Modeling for Submicron FET Integrated Circuits

  • Author

    Chatterjee, Pallab K.

  • Author_Institution
    Texas Instruments, Inc., Dallas, TX, USA
  • Volume
    5
  • Issue
    1
  • fYear
    1982
  • fDate
    3/1/1982 12:00:00 AM
  • Firstpage
    122
  • Lastpage
    126
  • Abstract
    Phys!cal understanding of submicron device phenomena is key to the efficient use of these structures in circuit applications and to the invention of new device structures and concepts. Modeling activities are categorized in hierarchical levels of abstraction which extends the concept of hierarchical system simulation down to the fundamental levels of process modeling. Major emphasis in field-effect transistor (FET) modeling beyond the micron dimension is on the incorporation of geometry effects and high field transport on active devices. As geometry sizes shrink, the effects of both carrier types become important even in unipolar devices. For very large-scale integrated (VLSI) circuits at these geometries modeling of parasitic devices like interconnections and isolation are important in determining circuit operation and performance.
  • Keywords
    FET integrated circuits; Circuit simulation; FET integrated circuits; Fabrication; Geometry; Integrated circuit modeling; Poisson equations; Semiconductor process modeling; Silicon; Solid modeling; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/TCHMT.1982.1135930
  • Filename
    1135930