• DocumentCode
    964596
  • Title

    Technological Advances in Physical Vapor Deposition

  • Author

    Herklotz, Guenther ; Eligehausen, Hans

  • Author_Institution
    W. C. Heraeus, Hanau, West Germany
  • Volume
    6
  • Issue
    2
  • fYear
    1983
  • fDate
    6/1/1983 12:00:00 AM
  • Firstpage
    173
  • Lastpage
    180
  • Abstract
    In the production of contact materials physical vapor deposition (PVD) technology is widely used. After a short description of the different PVD processes, the influences of the most important process parameters on the plating quality will be discussed. Also some technological applications will be cited.
  • Keywords
    Coatings; Contacts; Ion radiation effects/protection; Vacuum technology; Atherosclerosis; Boats; Chemical technology; Chemical vapor deposition; Coatings; Inorganic materials; Production; Resistance heating; Sputtering; Vacuum technology;
  • fLanguage
    English
  • Journal_Title
    Components, Hybrids, and Manufacturing Technology, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0148-6411
  • Type

    jour

  • DOI
    10.1109/TCHMT.1983.1136170
  • Filename
    1136170
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=964596