DocumentCode
968763
Title
Simulation of capacitively coupled single- and dual-frequency RF discharges
Author
Lee, Jae Koo ; Babaeva, Natalia Yu ; Kim, Hyun Chul ; Manuilenko, Oleg V. ; Shon, Jong Won
Author_Institution
Electron. & Electr. Eng. Dept., Pohang Univ. of Sci. & Technol., South Korea
Volume
32
Issue
1
fYear
2004
Firstpage
47
Lastpage
53
Abstract
For a single-frequency capacitively coupled radio-frequency discharge, the detailed examination has been carried out of plasma density and sheath width, average potential profiles, ion-energy distribution at the electrodes and electron-energy distribution in the bulk plasma as a function of pressure, voltage, and frequency using particle-in-cell/Monte Carlo simulation. The results for Ar gas are presented. Scaling of plasma parameters with external parameters is determined. The characteristics of dual-frequency argon discharge are studied for different ratio of high/low frequencies. Nonmonotonous behavior of plasma density versus low-frequency voltages is attributed to the increase of sheath width and, as a consequence, to the increase of energy absorbed by ions in the sheath region. Subsequent decrease of energy absorbed by electrons results in the decrease of plasma density. For certain frequency ratio with the further increase of power, the plasma density increases again until the collapse of the bulk occurs.
Keywords
Monte Carlo methods; argon; high-frequency discharges; plasma density; plasma pressure; plasma sheaths; plasma simulation; Ar; Monte Carlo simulation; argon gas; average potential profiles; bulk plasma; dual-frequency argon discharge; dual-frequency capacitively coupled RF discharge simulation; electrodes; electron-energy distribution; energy absorption; external parameters; ion-energy distribution; low-frequency voltages; nonmonotonous behavior; particle-in-cell; plasma density; pressure; scaling plasma parameters; sheath width; single-frequency capacitively coupled RF discharge simulation; Argon; Electrodes; Fault location; Plasma applications; Plasma density; Plasma properties; Plasma sheaths; Plasma simulation; Radio frequency; Voltage;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2004.823975
Filename
1291601
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