DocumentCode :
969741
Title :
Parameter extraction from I-V characteristics of single MOSFETs
Author :
Selmi, Luca ; Sangiorgi, Enrico ; Riccò, Bruno
Author_Institution :
Dept. of Electron., Bologna Univ., Italy
Volume :
36
Issue :
6
fYear :
1989
fDate :
6/1/1989 12:00:00 AM
Firstpage :
1094
Lastpage :
1101
Abstract :
A method is presented to extract the bias-dependent series resistances and intrinsic conductance factor of individual MOS transistors from measured I-V characteristics. If applied to groups of scaled channel length devices, it also allows determination of the effective channel length together with the transversal field dependence of the carrier mobility. The method is exactly derived from conventional MOS theory based on the gradual channel approximation, and the deviations from such an ideal case are studied by means of two-dimensional device simulations. Experimental results obtained with n- and p-channel transistors of conventional as well as LDD type are presented to show the correctness of the proposed extraction procedure
Keywords :
insulated gate field effect transistors; parameter estimation; semiconductor device models; LDD transistors; bias-dependent series resistances; carrier mobility; conventional MOS theory; effective channel length; gradual channel approximation; individual MOS transistors; intrinsic conductance factor; measured I-V characteristics; n-channel transistors; p-channel transistors; parameter extraction; scaled channel length devices; single MOSFETs; transversal field dependence; two-dimensional device simulations; Electrical resistance measurement; Extrapolation; Helium; MOSFET circuits; Parameter extraction; Physics; Uncertainty; Variable structure systems;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.24353
Filename :
24353
Link To Document :
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