• DocumentCode
    969741
  • Title

    Parameter extraction from I-V characteristics of single MOSFETs

  • Author

    Selmi, Luca ; Sangiorgi, Enrico ; Riccò, Bruno

  • Author_Institution
    Dept. of Electron., Bologna Univ., Italy
  • Volume
    36
  • Issue
    6
  • fYear
    1989
  • fDate
    6/1/1989 12:00:00 AM
  • Firstpage
    1094
  • Lastpage
    1101
  • Abstract
    A method is presented to extract the bias-dependent series resistances and intrinsic conductance factor of individual MOS transistors from measured I-V characteristics. If applied to groups of scaled channel length devices, it also allows determination of the effective channel length together with the transversal field dependence of the carrier mobility. The method is exactly derived from conventional MOS theory based on the gradual channel approximation, and the deviations from such an ideal case are studied by means of two-dimensional device simulations. Experimental results obtained with n- and p-channel transistors of conventional as well as LDD type are presented to show the correctness of the proposed extraction procedure
  • Keywords
    insulated gate field effect transistors; parameter estimation; semiconductor device models; LDD transistors; bias-dependent series resistances; carrier mobility; conventional MOS theory; effective channel length; gradual channel approximation; individual MOS transistors; intrinsic conductance factor; measured I-V characteristics; n-channel transistors; p-channel transistors; parameter extraction; scaled channel length devices; single MOSFETs; transversal field dependence; two-dimensional device simulations; Electrical resistance measurement; Extrapolation; Helium; MOSFET circuits; Parameter extraction; Physics; Uncertainty; Variable structure systems;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.24353
  • Filename
    24353