DocumentCode :
969818
Title :
An analytic model for thin SOI transistors
Author :
Mckitterick, John B. ; Caviglia, Anthony L.
Author_Institution :
Allied-Signal Aerosp. Technol., Columbia, MD, USA
Volume :
36
Issue :
6
fYear :
1989
fDate :
6/1/1989 12:00:00 AM
Firstpage :
1133
Lastpage :
1138
Abstract :
A simple charge sheet model is shown to provide a surprisingly accurate approximation to the behavior of a long-channel FET fabricated in a silicon-on-insulator (SOI) structure with a very thin silicon film. Using this charge sheet model, an accurate calculation of the I-V characteristics of transistors fabricated in these thin films is derived. Included in the results is an expression for the threshold voltage which shows, among other things, that the threshold voltage of suitably designed transistors is only logarithmically dependent on the thickness of the silicon film
Keywords :
insulated gate field effect transistors; semiconductor device models; semiconductor-insulator boundaries; I-V characteristics; SOI MOSFETs; Si on insulator; analytic model; charge sheet model; long-channel FET; thin SOI transistors; thin Si films; threshold voltage; Charge carrier processes; Dielectric devices; Dielectric thin films; FETs; Optical films; Semiconductor films; Silicon on insulator technology; Thin film transistors; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.24358
Filename :
24358
Link To Document :
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