DocumentCode
973483
Title
Superior microwave performance of InGaAs JFETs grown by MBE
Author
Trommer, Dirk ; Umbach, A. ; Passenburg, W. ; Mekonnen, G. ; Unterborsch, Gunter
Author_Institution
Heinrich Hertz Inst. for Nachrichtentech. Berlin, GmbH, West Germany
Volume
26
Issue
11
fYear
1990
fDate
5/24/1990 12:00:00 AM
Firstpage
734
Lastpage
736
Abstract
The realisation of high performance InGaAs JFETs designed for InP based optoelectronic integration is reported. An optimised MBE process for the gate layer growth is presented. JFETs fabricated by using a self-aligning technique exhibit very high cut-off frequencies of fT=28 GHz and fMAX=38 GHz.
Keywords
III-V semiconductors; gallium arsenide; indium compounds; integrated optoelectronics; junction gate field effect transistors; molecular beam epitaxial growth; semiconductor growth; solid-state microwave devices; 28 GHz; 38 GHz; InGaAs; InP based optoelectronic integration; JFETs; OEIC; gate layer growth; microwave performance; optimised MBE process; self-aligning technique;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19900479
Filename
106048
Link To Document