DocumentCode
974095
Title
Construction and Electrical Properties of a Germanium Alloy-Diffused Transistor
Author
Jochems, P.J.W. ; Memelink, O.W. ; Tummers, L.J.
Author_Institution
Philips Res. Labs., N. V. Philips´´ Gloeilampenfabrieken, Eindhoven, Netherlands
Volume
46
Issue
6
fYear
1958
fDate
6/1/1958 12:00:00 AM
Firstpage
1161
Lastpage
1165
Abstract
The fabrication of high-frequency transistors by the alloy-diffusion method is described. A group of transistors was subjected to an extensive series of measurements in order to establish an equivalent circuit characterizing the transistor for small ac amplitudes at à fixed dc bias. The resulting "physical" T-equivalent circuit is valid up to at least 25 mc. The different circuit elements are discussed with respect to their physical background. A translation from the T-circuit into the electrically more convenient ¿-circuit is also presented.
Keywords
Alloying; Aluminum alloys; Equivalent circuits; Fabrication; Frequency; Germanium alloys; Manufacturing; Solids; Temperature; Thickness control;
fLanguage
English
Journal_Title
Proceedings of the IRE
Publisher
ieee
ISSN
0096-8390
Type
jour
DOI
10.1109/JRPROC.1958.286898
Filename
4065457
Link To Document