• DocumentCode
    974182
  • Title

    The Blocking Capability ot Alloyed Silicon Power Transistors

  • Author

    Emeis, R. ; Herlet, A.

  • Author_Institution
    Siemens-Schuckertwerke AG, Pretzfeld ÿber Forchheim, Oberfranken, Germany
  • Volume
    46
  • Issue
    6
  • fYear
    1958
  • fDate
    6/1/1958 12:00:00 AM
  • Firstpage
    1216
  • Lastpage
    1220
  • Abstract
    An extensive series of silicon n-p-n alloyed transistors has been made. One set of these transistors has base thicknesses of 40-45 ¿; the other, 55-60 ¿. In each group the base resistiv ity is varied from 2 ohm-cm to 7000 ohm-cm. The "blocking capability" of these transistors is plotted against base resistivity. The results are compared with theory. Agreement is good. Details of the current-voltage characteristic are discussed. Three base resistivity regions are distinguished: 1) pure breakdown; 2) approximately simultaneous occurrence of breakdown and punch-through; and 3) pure punch-through.
  • Keywords
    Conductivity; Electric breakdown; Germanium; Lead; Leakage current; Power transistors; Scattering; Silicon alloys; Uncertainty; Voltage;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IRE
  • Publisher
    ieee
  • ISSN
    0096-8390
  • Type

    jour

  • DOI
    10.1109/JRPROC.1958.286906
  • Filename
    4065465