High coercivity and high saturation magnetization Mn-Al thin films

Author

Huang, J.H. ; Kuo, P.C. ; Shen, S.C.

Author_Institution

Inst. of Mater. Sci. & Eng., Nat. Taiwan Univ., Taipei, Taiwan

Volume

31

Issue

5

fYear

1995

fDate

9/1/1995 12:00:00 AM

Firstpage

2494

Lastpage

2498

Abstract

Mn-Al thin films with the composition of 31-68 at.% Mn were prepared by rf magnetron sputtering at various substrate temperatures then annealed in vacuum. Effects of the chemical composition, substrate temperature and annealing temperature on the magnetic properties of Mn-Al films have been investigated. The analysis of X-ray diffraction and magnetic measurement indicate that τ-phase was synthesized at a composition range of 40-60 at.% Mn. However, the formation of large amount of τ-phase occurred for Mn₅₀-Al₅₀ films, which have a high coercivity up to about 3000 Oe and a fairly large saturation magnetization of about 420 emu/cc

Keywords

X-ray diffraction; aluminium alloys; annealing; coercive force; ferromagnetic materials; magnetic thin films; magnetisation; manganese alloys; sputtered coatings; τ-phase; MnAl; X-ray diffraction; annealing temperature; chemical composition; coercivity; ferromagnetic phase; magnetic thin films; rf magnetron sputtering; saturation magnetization; substrate temperature; Annealing; Chemicals; Coercive force; Magnetic analysis; Magnetic films; Magnetic properties; Saturation magnetization; Sputtering; Temperature; Transistors;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.406550

Filename

406550