• DocumentCode
    976016
  • Title

    High performance Al0.48In0.52As/Ga0.47In0.53As HFETs

  • Author

    Dambkes, H. ; Marschall, P.

  • Author_Institution
    Daimler-Benz AG Res. Inst., Ulm, West Germany
  • Volume
    26
  • Issue
    7
  • fYear
    1990
  • fDate
    3/29/1990 12:00:00 AM
  • Firstpage
    488
  • Lastpage
    490
  • Abstract
    MBE grown Al0.48In0.52As/Ga0.47In0.53As heterostructure field effect transistors have been fabricated on InP substrates. DC characteristics of 1.3 mu m gate devices show no kink effects and no breakdown, even for drain to gate voltages in excess of -4.5 V, thus demonstrating excellent material properties. High frequency investigations reveal a very low output conductance of about 12 mS/mm and a transconductance in excess of 420 mS/mm. Cutoff frequencies of 75 GHz are achieved for 1.3 mu m gate length. These values are the highest reported for devices of this geometry at room temperature.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device models; solid-state microwave devices; -4.5 V; 1.3 micron; 75 GHz; Al 0.48In 0.52As-Ga 0.47In 0.53As; DC characteristics; HEMT; HFETs; InP substrates; MBE; heterostructure field effect transistors; low output conductance; models; room temperature; transconductance;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19900317
  • Filename
    50248