• DocumentCode
    976891
  • Title

    Secondary electron yield measurements from materials with application to collectors of high-power microwave devices

  • Author

    Zameroski, Nathan D. ; Kumar, Prashanth ; Watts, Christopher ; Svimonishvili, Tengiz ; Gilmore, Mark ; Schamiloglu, Edl ; Gaudet, John A.

  • Volume
    34
  • Issue
    3
  • fYear
    2006
  • fDate
    6/1/2006 12:00:00 AM
  • Firstpage
    642
  • Lastpage
    651
  • Abstract
    An experimental test facility has been established for measuring the secondary electron yield (SEY) of materials thought to be suitable for low yield vacuum electronic applications such as collectors in high-power microwave (HPM) tubes. Experiments can be broadly divided into two energy-regimes: a high-energy (1-50 keV) and a low-energy (10 eV-1 keV) regime. Measurements of SEY at high energies are presented for the following materials: copper, titanium, and Poco graphite. Observation of time-dependent SEY behavior in these samples suggests that surface processes play an important role during measurements. In addition, SEY at low energies and as a function of the angle of incidence of primary electrons has been measured for plasma sprayed boron carbide (PSBC). The experimental results presented here are benchmarked with existing SEY data in the literature, empirically and to first principle formulae
  • Keywords
    copper; graphite; microwave generation; microwave tubes; secondary electron emission; titanium; 0.01 to 50 keV; C; Cu; Poco graphite; Ti; collectors; high-power microwave devices; incidence angle; microwave tubes; plasma sprayed boron carbide; secondary electron yield; vacuum electronic applications; Copper; Electron tubes; Energy measurement; Microwave devices; Microwave measurements; Plasma materials processing; Plasma measurements; Test facilities; Thermal spraying; Titanium; Collectors; depressed collectors; high-power microwaves (HPMs); secondary electron yield (SEY); secondary electrons;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2006.875778
  • Filename
    1643286