DocumentCode
977906
Title
Some properties of Nb-Nb2 O5 -Pb(In) Josephson tunnel junctions for devices applications
Author
Villegier, J.C. ; Matheron, G.
Author_Institution
Commissariat à ĺEnergie Atomique, Grenoble France
Volume
17
Issue
1
fYear
1981
fDate
1/1/1981 12:00:00 AM
Firstpage
855
Lastpage
857
Abstract
A detailed investigation of tunneling has been carried out on Nb-Nb2 O5 -Pb(In) junctions where the tunnel barrier is made-of Nb2 O5 thermal oxide with accurately controlled oxidation parameters. The oxide barrier appears as a n-type semiconductor with two Schottky barriers at the interfaces. The transport of charged oxygen vacancies is supposed to play a fundamental role in the oxidation process. The barrier potential φ and the tunnel resistance R have been related to the oxidation parameters. The junctions realized have sizes ranging from 4 to 104μm2, the Josephson current density, dependent on the oxide thickness, is in the 1-105A/cm2range. Very low transition times from the superconductive to the normal state have been observed.
Keywords
Josephson devices; Dielectric constant; Electrical resistance measurement; Josephson effect; Kinetic theory; Niobium; Oxidation; Radio frequency; Shape measurement; Tunneling; Voltage;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1981.1060896
Filename
1060896
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