• DocumentCode
    977906
  • Title

    Some properties of Nb-Nb2O5-Pb(In) Josephson tunnel junctions for devices applications

  • Author

    Villegier, J.C. ; Matheron, G.

  • Author_Institution
    Commissariat à ĺEnergie Atomique, Grenoble France
  • Volume
    17
  • Issue
    1
  • fYear
    1981
  • fDate
    1/1/1981 12:00:00 AM
  • Firstpage
    855
  • Lastpage
    857
  • Abstract
    A detailed investigation of tunneling has been carried out on Nb-Nb2O5-Pb(In) junctions where the tunnel barrier is made-of Nb2O5thermal oxide with accurately controlled oxidation parameters. The oxide barrier appears as a n-type semiconductor with two Schottky barriers at the interfaces. The transport of charged oxygen vacancies is supposed to play a fundamental role in the oxidation process. The barrier potential φ and the tunnel resistance R have been related to the oxidation parameters. The junctions realized have sizes ranging from 4 to 104μm2, the Josephson current density, dependent on the oxide thickness, is in the 1-105A/cm2range. Very low transition times from the superconductive to the normal state have been observed.
  • Keywords
    Josephson devices; Dielectric constant; Electrical resistance measurement; Josephson effect; Kinetic theory; Niobium; Oxidation; Radio frequency; Shape measurement; Tunneling; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1981.1060896
  • Filename
    1060896