All-UV-written integrated planar Bragg gratings and channel waveguides through single-step direct grating writing

Author

Emmerson, G.D. ; Gawith, C.B.E. ; Watts, S.P. ; Williams, R.B. ; Smith, P.G.R. ; McMeekin, S.G. ; Bonar, J.R. ; Laming, R.I.

Author_Institution

Optoelectronics Res. Centre, Univ. of Southampton, UK

Volume

151

Issue

2

fYear

2004

fDate

4/26/2004 12:00:00 AM

Firstpage

119

Lastpage

122

Abstract

A single-step technique is presented, for defining two-dimensional integrated channel waveguide structures with internal Bragg gratings in photosensitive germanosilica-on-silicon substrates using two interfering focused UV beams. Detailed device analysis of the relationship between the photosensitive properties of the glass, UV writing conditions, and subsequent refractive index change and channel waveguide strength is presented, based on grating characterisation. Through software control, 300 nm-wide grating detuning across the E, S, C, L, and U wavelength bands is demonstrated.

Keywords

Bragg gratings; integrated optics; laser materials processing; optical glass; optical planar waveguides; optical tuning; optical waveguides; refractive index; ultraviolet radiation effects; 300 nm; 300 nm-wide grating detuning; SiO₂:Ge-Si; UV writing conditions; all-UV-written integrated planar Bragg gratings; channel waveguide strength; channel waveguides; glass photosensitive properties; interfering focused UV beams; internal Bragg gratings; photosensitive germanosilica-on-silicon substrates; refractive index change; single-step direct grating writing; software control; two-dimensional integrated channel waveguide structures;

fLanguage

English

Journal_Title

Optoelectronics, IEE Proceedings -

Publisher

iet

ISSN

1350-2433

Type

jour

DOI

10.1049/ip-opt:20040182

Filename

1295763