• DocumentCode
    979564
  • Title

    Field Effect on Silicon Transistors

  • Author

    Schwartz, B. ; Levy, M.

  • Author_Institution
    Semiconductor Div., Hughes Products, Newport Beach, Calif.
  • Volume
    48
  • Issue
    3
  • fYear
    1960
  • fDate
    3/1/1960 12:00:00 AM
  • Firstpage
    317
  • Lastpage
    320
  • Abstract
    A field effect has been observed on an operating silicon transistor. The results have been interpreted as being due to changes in surface recombination velocity produced by changes in surface potential. Using this approach, it was possible to calculate the surface recombination velocity of the base region of an operating device directly, without having to go to a filament measuring technique and then extrapolating back to the device. Relaxation phenomena have also been observed which can be interpreted as being due to a transfer of charge between the fast and the slow states at the surface. Time constants for this transition have been calculated.
  • Keywords
    Conductivity measurement; Electrodes; Electrostatics; FETs; Germanium; P-n junctions; Pulse modulation; Radiative recombination; Semiconductor materials; Silicon;
  • fLanguage
    English
  • Journal_Title
    Proceedings of the IRE
  • Publisher
    ieee
  • ISSN
    0096-8390
  • Type

    jour

  • DOI
    10.1109/JRPROC.1960.287601
  • Filename
    4066020