DocumentCode
979564
Title
Field Effect on Silicon Transistors
Author
Schwartz, B. ; Levy, M.
Author_Institution
Semiconductor Div., Hughes Products, Newport Beach, Calif.
Volume
48
Issue
3
fYear
1960
fDate
3/1/1960 12:00:00 AM
Firstpage
317
Lastpage
320
Abstract
A field effect has been observed on an operating silicon transistor. The results have been interpreted as being due to changes in surface recombination velocity produced by changes in surface potential. Using this approach, it was possible to calculate the surface recombination velocity of the base region of an operating device directly, without having to go to a filament measuring technique and then extrapolating back to the device. Relaxation phenomena have also been observed which can be interpreted as being due to a transfer of charge between the fast and the slow states at the surface. Time constants for this transition have been calculated.
Keywords
Conductivity measurement; Electrodes; Electrostatics; FETs; Germanium; P-n junctions; Pulse modulation; Radiative recombination; Semiconductor materials; Silicon;
fLanguage
English
Journal_Title
Proceedings of the IRE
Publisher
ieee
ISSN
0096-8390
Type
jour
DOI
10.1109/JRPROC.1960.287601
Filename
4066020
Link To Document