Title :
Quantitative Experimental Analysis of Schottky Barriers and Poole–Frenkel Emission in Carbon Nanotube Devices
Author :
Perello, David ; Bae, Dong Jae ; Kim, Moon.J. ; Cha, Dongkyu ; Jeong, Seung Yol ; Kang, Bo Ram ; Yu, Woo Jong ; Lee, Young Hee ; Yun, Minhee
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Pittsburgh, Pittsburgh, PA
fDate :
5/1/2009 12:00:00 AM
Abstract :
In this paper, we investigated carbon nanotube FETs (CNT FETs) utilizing semiconducting single-walled CNTs (SWCNTs). Multiple devices, each of different metal source and drain contacts, were fabricated on a single SWCNT. Over specific temperature regimes, transport properties of the devices were found to be consistent with the Bethe theory of thermionic emission for Schottky contacts, and the Poole-Frenkel emission was dependent on the device position. As was expected, transport from thermionic emission over the barrier was found to be the dominant mechanism. Barriers of 25-41 meV were present, as found by activation energy analysis for temperatures ranging from 20 to 300 K for the devices. A Schottky diode was also fabricated on a separate nanotube using an ohmic contact at the Pd source and a Schottky contact for the Ag drain electrode. Assuming the same physical assumptions for an Si semiconductor device, the results indicate an ideality factor greater than 2, Schottky barrier of ~0.37 eV, and image charge lowering of ~0.1 eV.
Keywords :
Poole-Frenkel effect; Schottky barriers; Schottky diodes; carbon nanotubes; elemental semiconductors; field effect devices; nanotube devices; ohmic contacts; thermionic emission; Bethe theory; C; CNT FET; Pd source; Poole-Frenkel emission; SWCNT; Schottky barriers; Schottky contact; Schottky diode; activation energy analysis; carbon nanotube device; drain contact; ideality factor; image charge; metal source; ohmic contact; quantitative analysis; semiconducting single-walled carbon nanotube; temperature 20 K to 300 K; thermionic emission; transport property; Carbon nanotubes (CNTs); manufacturing; nanoarchitecture;
Journal_Title :
Nanotechnology, IEEE Transactions on
DOI :
10.1109/TNANO.2008.2008804