• DocumentCode
    982702
  • Title

    High-frequency ultrasonic cleaning tank utilizing oblique incidence

  • Author

    Hatano, Hajime ; Kanai, Sadao

  • Author_Institution
    Dept. of Appl. Electron., Sci. Univ. of Tokyo, Japan
  • Volume
    43
  • Issue
    4
  • fYear
    1996
  • fDate
    7/1/1996 12:00:00 AM
  • Firstpage
    531
  • Lastpage
    535
  • Abstract
    Transmission characteristics of a double-structured tank, used for high-frequency (1 MHz range) ultrasonic cleaning of semiconductor wafers and substrates, were improved by utilizing oblique incidence of ultrasonic waves. As the sound transmittivity through a plate in water varies with the angle of incidence, the bottom of the Pyrex glass inner container was slanted at the angle where strong transmission occurred. In the slant-bottom container, an intensive and uniform sound pressure distribution was measured with a polyvinylidene fluoride (PVDF) hydrophone probe. In comparison with the conventional horizontal-bottom container, it was shown that the distributions as well as amplitude of sound pressure were remarkably improved by slanting the bottom of the inner container at the proper angle.
  • Keywords
    semiconductor technology; ultrasonic cleaning; 1 MHz; PVDF hydrophone probe; Pyrex glass plate; double-structured tank; high-frequency ultrasonic cleaning; oblique incidence; semiconductor substrates; semiconductor wafers; slant-bottom container; sound pressure distribution; sound transmittivity; Cleaning; Containers; Frequency; Glass; Power generation; Pressure measurement; Probes; Sonar equipment; Substrates; Ultrasonic variables measurement;
  • fLanguage
    English
  • Journal_Title
    Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0885-3010
  • Type

    jour

  • DOI
    10.1109/58.503712
  • Filename
    503712