DocumentCode
982702
Title
High-frequency ultrasonic cleaning tank utilizing oblique incidence
Author
Hatano, Hajime ; Kanai, Sadao
Author_Institution
Dept. of Appl. Electron., Sci. Univ. of Tokyo, Japan
Volume
43
Issue
4
fYear
1996
fDate
7/1/1996 12:00:00 AM
Firstpage
531
Lastpage
535
Abstract
Transmission characteristics of a double-structured tank, used for high-frequency (1 MHz range) ultrasonic cleaning of semiconductor wafers and substrates, were improved by utilizing oblique incidence of ultrasonic waves. As the sound transmittivity through a plate in water varies with the angle of incidence, the bottom of the Pyrex glass inner container was slanted at the angle where strong transmission occurred. In the slant-bottom container, an intensive and uniform sound pressure distribution was measured with a polyvinylidene fluoride (PVDF) hydrophone probe. In comparison with the conventional horizontal-bottom container, it was shown that the distributions as well as amplitude of sound pressure were remarkably improved by slanting the bottom of the inner container at the proper angle.
Keywords
semiconductor technology; ultrasonic cleaning; 1 MHz; PVDF hydrophone probe; Pyrex glass plate; double-structured tank; high-frequency ultrasonic cleaning; oblique incidence; semiconductor substrates; semiconductor wafers; slant-bottom container; sound pressure distribution; sound transmittivity; Cleaning; Containers; Frequency; Glass; Power generation; Pressure measurement; Probes; Sonar equipment; Substrates; Ultrasonic variables measurement;
fLanguage
English
Journal_Title
Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on
Publisher
ieee
ISSN
0885-3010
Type
jour
DOI
10.1109/58.503712
Filename
503712
Link To Document