DocumentCode
984952
Title
Submicrometre X-ray printing with X-ray masks delineated by high-voltage electron-beam writing
Author
Kawabuchi, K. ; Sakurai, S. ; Yoshimi, M.
Author_Institution
Toshiba Corporation, Integrated Circuits Laboratory, Toshiba Research & Development Center, Kawasaki, Japan
Volume
19
Issue
8
fYear
1983
Firstpage
287
Lastpage
288
Abstract
High-voltage electron-beam writing has been successfully utilised to fabricate high-resolution and high-accuracy X-ray masks with vertical-wall gold patterns which have made it possible to print a ¿ ¿m resist pattern without any pattern size variation across steps.
Keywords
electron beam applications; integrated circuit technology; large scale integration; masks; photolithography; IC technology; VLSI; X-ray masks; high-resolution; high-voltage electron-beam writing; resist pattern; submicron X-ray printing; vertical wall Au patterns;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19830200
Filename
4247591
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