DocumentCode
985950
Title
Modifications to MOS transistor model CASMOS for increased accuracy of DC simulations of heavily channel-doped n-MOS devices
Author
Brassington, M.P. ; Duckworth, C.N.
Author_Institution
GEC Research Laboratories, Hirst Research Centre, Wembley, UK
Volume
19
Issue
12
fYear
1983
Firstpage
447
Lastpage
449
Abstract
The absence of certain bulk charge terms from the CASMOS model equations leads to a reduced accuracy in the simulation of long-channel n-MOS devices which have channel-doping concentrations > 1Ã1016 cm¿3 This reduction in accuracy is proportional to gate length. The bulk charge terms responsible for this effect are identified and the model equations modified accordingly.
Keywords
insulated gate field effect transistors; semiconductor device models; CASMOS model equations; DC simulations; MOS transistor model; MOSFET; bulk charge terms; channel-doping concentrations; gate length; long-channel n-MOS devices; semiconductor devices;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19830306
Filename
4247780
Link To Document