Title :
Modifications to MOS transistor model CASMOS for increased accuracy of DC simulations of heavily channel-doped n-MOS devices
Author :
Brassington, M.P. ; Duckworth, C.N.
Author_Institution :
GEC Research Laboratories, Hirst Research Centre, Wembley, UK
Abstract :
The absence of certain bulk charge terms from the CASMOS model equations leads to a reduced accuracy in the simulation of long-channel n-MOS devices which have channel-doping concentrations > 1Ã1016 cm¿3 This reduction in accuracy is proportional to gate length. The bulk charge terms responsible for this effect are identified and the model equations modified accordingly.
Keywords :
insulated gate field effect transistors; semiconductor device models; CASMOS model equations; DC simulations; MOS transistor model; MOSFET; bulk charge terms; channel-doping concentrations; gate length; long-channel n-MOS devices; semiconductor devices;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19830306