• DocumentCode
    985950
  • Title

    Modifications to MOS transistor model CASMOS for increased accuracy of DC simulations of heavily channel-doped n-MOS devices

  • Author

    Brassington, M.P. ; Duckworth, C.N.

  • Author_Institution
    GEC Research Laboratories, Hirst Research Centre, Wembley, UK
  • Volume
    19
  • Issue
    12
  • fYear
    1983
  • Firstpage
    447
  • Lastpage
    449
  • Abstract
    The absence of certain bulk charge terms from the CASMOS model equations leads to a reduced accuracy in the simulation of long-channel n-MOS devices which have channel-doping concentrations > 1×1016 cm¿3 This reduction in accuracy is proportional to gate length. The bulk charge terms responsible for this effect are identified and the model equations modified accordingly.
  • Keywords
    insulated gate field effect transistors; semiconductor device models; CASMOS model equations; DC simulations; MOS transistor model; MOSFET; bulk charge terms; channel-doping concentrations; gate length; long-channel n-MOS devices; semiconductor devices;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19830306
  • Filename
    4247780