DocumentCode :
985950
Title :
Modifications to MOS transistor model CASMOS for increased accuracy of DC simulations of heavily channel-doped n-MOS devices
Author :
Brassington, M.P. ; Duckworth, C.N.
Author_Institution :
GEC Research Laboratories, Hirst Research Centre, Wembley, UK
Volume :
19
Issue :
12
fYear :
1983
Firstpage :
447
Lastpage :
449
Abstract :
The absence of certain bulk charge terms from the CASMOS model equations leads to a reduced accuracy in the simulation of long-channel n-MOS devices which have channel-doping concentrations > 1×1016 cm¿3 This reduction in accuracy is proportional to gate length. The bulk charge terms responsible for this effect are identified and the model equations modified accordingly.
Keywords :
insulated gate field effect transistors; semiconductor device models; CASMOS model equations; DC simulations; MOS transistor model; MOSFET; bulk charge terms; channel-doping concentrations; gate length; long-channel n-MOS devices; semiconductor devices;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19830306
Filename :
4247780
Link To Document :
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