• DocumentCode
    985960
  • Title

    DC-magnetron sputtered CoNiTa for high density longitudinal recording

  • Author

    Khan, Mahbub R. ; Fisher, R.D. ; Heiman, Neil

  • Author_Institution
    Seagate Magnetics, Fremont, CA, USA
  • Volume
    26
  • Issue
    1
  • fYear
    1990
  • fDate
    1/1/1990 12:00:00 AM
  • Firstpage
    118
  • Lastpage
    120
  • Abstract
    Ternary cobalt alloy thin films were sputtered in a DC magnetron system. The alloys investigated consisted of (Co75-Ni25 )1-xTax where x was varied from 0 to 20 at.%. The magnetic properties and microstructure of these films prepared with RF substrate bias as a function of composition, film thickness, Cr underlayer thickness, and temperature are reported. Tantalum additions to the CoNi result in a 100 to 200 Oe increase in coercive force depending upon the film thickness. The CoNiTa system approaches the superparamagnetic state at a thickness greater than for the CoNi system. The grain size of the CoNiTa is somewhat smaller than that of CoNi at similar thickness values. The increase in coercive force and decrease in S* associated with small Ta additions to CoNi films can be explained on the basis of Ta segregation to grain boundaries decreasing the exchange interaction and modifying the grain size
  • Keywords
    cobalt alloys; coercive force; ferromagnetic properties of substances; grain size; magnetic recording; magnetic thin films; nickel alloys; scanning electron microscope examination of materials; sputtered coatings; superparamagnetism; tantalum alloys; CoNiTa; DC magnetron sputtering; RF substrate bias; SEM; Ta segregation; coercive force; exchange interaction; ferromagnet; grain boundaries; grain size; high density longitudinal recording; magnetic properties; microstructure; superparamagnetic state; Chromium; Cobalt alloys; Coercive force; Grain size; Magnetic films; Magnetic properties; Microstructure; Radio frequency; Sputtering; Substrates;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/20.50508
  • Filename
    50508