DocumentCode
986349
Title
On the study of interdiffusion in thin films by magnetic methods
Author
Chiriac, Horia
Author_Institution
Technical Physics Center, Iasi, Romania
Volume
17
Issue
6
fYear
1981
fDate
11/1/1981 12:00:00 AM
Firstpage
3166
Lastpage
3168
Abstract
The interdiffusion in Ni-Cu and Ni-Mn thin films has been studied by means of their magnetic moment and its variation with temperature. A new calculation method of diffusion coefficients, based on the dependence of magnetic moments upon the diffusion time, has been proposed. It is shown, that the diffusion coefficient determined in this way have a global meaning of several diffusion mechanisms.
Keywords
Magnetic films; Annealing; Copper; Crystallization; Grain boundaries; Lattices; Magnetic films; Nickel; Substrates; Temperature; Transistors;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1981.1061664
Filename
1061664
Link To Document