• DocumentCode
    987179
  • Title

    Co-Cr films for perpendicular recording

  • Author

    Wielinga, T. ; Lodder, J.C.

  • Author_Institution
    Twente University of Technology, Enschede, The Netherlands
  • Volume
    17
  • Issue
    6
  • fYear
    1981
  • fDate
    11/1/1981 12:00:00 AM
  • Firstpage
    3178
  • Lastpage
    3180
  • Abstract
    Co-Cr films were prepared by means of RF-sputtering. The dependence of the magnetic parameters on the sputter conditions was investigated. It was found that for increasing Ar-pressure the c-axis of the hcp-structure gradually declines from normal to in-plane orientation. An optimum for the sputter voltage is found. The coercivity increases with decreasing target-substrate distance and this is probably due to surface heating by electron bombardment from the Ar-plasma. The recording characteristics of these Co-Cr films were then investigated by means of standstill recording experiments. A 6.7 μm thick permalloy single-pole head (SPH) was used for creating a head print in a 1 μm thick Co-Cr layer. The flux reversals are detected by means of a magneto-resistive transducer (MRT). The response was analyzed, using a analytical method for calculating the magnetization distribution in the Co-Cr layer. For this purpose the head field of the SPH was also determined with the same MRT.
  • Keywords
    Magnetic anisotropy; Magnetic films; Sputtering; Coercive force; Electrons; Heating; Magnetic analysis; Magnetic films; Magnetic flux; Magnetic heads; Perpendicular magnetic recording; Transducers; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1981.1061732
  • Filename
    1061732