Title :
High-Q electrostatic discharge (ESD) protection devices for use at radio frequency (RF) and broad-band I/O pins
Author :
Joshi, Sopan ; Hyvonen, Sami ; Rosenbaum, Elyse
Author_Institution :
Univ. of Illinois, Urbana-Champaign, IL, USA
fDate :
7/1/2005 12:00:00 AM
Abstract :
Radio frequency and broad-band I/O circuit designers may compensate for the capacitance of electrostatic discharge (ESD) protection elements by designing them into tuned resonators or matched filters, thereby requiring that the protection device capacitance have a high quality factor (Q). In this paper, we explore several ESD protection device options, focusing on improvement in Q. We show that surrounding a grounded-gate nMOS transistor with a deep trench increases its Q, while adding a trigger circuit decreases it. We also show that SiGe diodes are preferred over SiGe n-p-n devices. A detailed analysis of experimental results is provided.
Keywords :
Ge-Si alloys; MOSFET; Q-factor; capacitance; electrostatic discharge; radiofrequency integrated circuits; resonators; semiconductor device models; semiconductor diodes; trigger circuits; ESD protection device; SiGe; SiGe diode; SiGe n-p-n device; broad-band I/O circuit design; high-Q electrostatic discharge; nMOS transistor; protection device capacitance; quality factor; radio frequency; Capacitance; Electrostatic discharge; Germanium silicon alloys; Matched filters; Pins; Protection; Q factor; Radio frequency; Silicon germanium; Tuned circuits; Broadband integrated circuits; RF integrated circuits; electrostatic discharge protection; quality factor;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2005.850688