Title :
Aluminium-free GaAs/GaInAsP quantum well lasers
Author :
Zhang, Ge ; Nappi, J. ; Ovtchinnikov, A. ; Asonen, H.
Author_Institution :
Tampere Univ. of Technol., Finland
fDate :
3/4/1993 12:00:00 AM
Abstract :
Al-free GaAs/GaInAsP separate-confinement-heterostructure single-quantum-well lasers are reported. The laser structure was grown by gas-source molecular beam epitaxy. A low threshold current density of 207 A/cm2 and a high characteristic temperature of 167 K were achieved for the uncoated broad-area lasers. The transparency current density was 58 A/cm2 and gain coefficient 0.039 cm mu m A-1. The internal quantum efficiency and internal waveguide loss were 86% and 5.7 cm-1, respectively. The results are comparable to those obtained for GaAs/AlGaAs quantum well lasers.
Keywords :
III-V semiconductors; chemical beam epitaxial growth; gallium arsenide; gallium compounds; indium compounds; semiconductor growth; semiconductor lasers; 0.87 micron; 167 K; 22 mA; GaAs-GaInAsP quantum well lasers; broad-area lasers; characteristic temperature; gain coefficient; gas-source molecular beam epitaxy; internal quantum efficiency; internal waveguide loss; separate-confinement-heterostructure single-quantum-well lasers; threshold current density; transparency current density;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19930287