DocumentCode :
993000
Title :
MC simulation of strained-Si MOSFET with full-band structure and quantum correction
Author :
Fan, Xiao-Feng ; Wang, Xin ; Winstead, Brian ; Register, Leonard F. ; Ravaioli, Umberto ; Banerjee, Sanjay K.
Author_Institution :
Dept. of Electr. & Comput. Eng., Texas Univ., Austin, TX, USA
Volume :
51
Issue :
6
fYear :
2004
fDate :
6/1/2004 12:00:00 AM
Firstpage :
962
Lastpage :
970
Abstract :
A new two-dimensional full-band Monte Carlo simulator, "Monte Carlo University of Texas" (MCUT) is introduced and described in this paper. MCUT combines some of the best features of semiclassical MC device simulation including full-band structure and flexibility of scattering processes, with generality of material composition and the ability to address degeneracy breaking among energy valleys and the associated effects on scattering and transport due to quantum confinement and strain effects. The latter capability derives from extension of a prior crystal-momentum-independent self-consistent Poisson-Schrödinger-based quantum corrected potential, to a valley dependent quantum correction via, in part, a new modeling concept of "effective strain" within the full-band structure code. Low field mobility simulation results for large tensile strained-Si channel nMOSFETs and unstrained-Si channel nMOSFETs device are compared with other simulation methods and experimental data to demonstrate the effectiveness of the approach, and the abilities to simulate high-field transport and transport in devices of a few 10s of nanometer channel lengths are briefly demonstrated.
Keywords :
MOSFET; Monte Carlo methods; Poisson equation; Schrodinger equation; circuit CAD; elemental semiconductors; nanoelectronics; semiconductor device models; silicon; MC simulation; MCUT; Monte Carlo University of Texas; Poisson-Schrodinger-based potential; SiGe heterostructures; crystal-momentum-independent potential; degeneracy breaking; effective strain; energy valleys; full-band Monte Carlo simulator; full-band structure; high-field transport; low field mobility simulation; material composition; metal-oxide-semiconductor field-effect transistors; nanometer channel lengths; quantum confinement; quantum corrected potential; quantum effects; scattering processes; self-consistent potential; semiclassical MC device simulation; strain effects; strained-Si MOSFET; strained-silicon; tensile strained-Si channel nMOSFET; unstrained-Si channel nMOSFET; valley dependent quantum correction; Capacitive sensors; Electron mobility; Germanium silicon alloys; Light scattering; MOSFET circuits; Monte Carlo methods; Particle scattering; Potential well; Quantum computing; Silicon germanium; Full-band Monte Carlo; MC; MOSFET simulations; SiGe heterostructures; quantum effects; strained-silicon;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2004.828296
Filename :
1300832
Link To Document :
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