A Control System Based on PXI Technology for the ECRH Power Supply of J-TEXT

Author

Shao Xiang Ma ; Ming Zhang ; De Hong Chen ; Ling Long Xia ; Zhen Zeng ; Xue Liang Zhang ; Chu Liang Wang ; Ke Xun Yu

Author_Institution

State Key Lab. of Adv. Electromagn. Eng. & Technol., Huazhong Univ. of Sci. & Technol., Wuhan, China

Volume

42

Issue

6

fYear

2014

fDate

Jun-14

Firstpage

1709

Lastpage

1713

Abstract

A 100-kV/60-A high-voltage power supply (HVPS) is developed to supply the auxiliary heating system for a J-TEXT tokamak. This power supply is based on pulse step modulation (PSM) technology and consists of 144 switch modules. To fulfill the isolation, control, and protection requirements, a control system based on the PCI extensions for instrumentation is designed with the PSM technology for the HVPS. Experimental results show that the system has a good control performance and fast response. Thus, the proposed system meets the control requirement of the 100-kV/60-A HVPS.

Keywords

Tokamak devices; plasma radiofrequency heating; plasma toroidal confinement; power supplies to apparatus; pulse modulation; ECRH power supply; HVPS; J-TEXT tokamak; PCI extensions; PSM; PXI technology; auxiliary heating system; control performance; control system; current 60 A; electron cyclotron resonance heating; fast response; high-voltage power supply; isolation requirements; protection requirements; pulse step modulation technology; switch modules; voltage 100 kV; Control systems; Educational institutions; Field programmable gate arrays; Power supplies; Pulse width modulation; Standards; Voltage control; Control; extensions for instrumentation (PXI); field programmable gate array (FPGA); high-voltage power supply (HVPS); pulse step modulation (PSM); pulse step modulation (PSM).;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2014.2320288

Filename

6817583