Junctionless Biristor: A Bistable Resistor Without Chemically Doped P-N Junctions

In this paper, using 2-D simulations, we report a novel junction-less biristor in which the emitter and collector regions are created by applying the charge plasma concept on a P-doped silicon film. Since no chemical doping is required, the junction-less biristor can be realized with a low thermal budget. We demonstrate that the junction-less biristor exhibits not only a significant low latch-up voltage (2.0 V) but also has a large latch window (0.66 V) when compared to that of a conventional silicon biristor with similar parameters. The reasons for this improved performance are discussed.