• DocumentCode
    996992
  • Title

    Mechanisms of Enhanced Radiation-Induced Degradation Due to Excess Molecular Hydrogen in Bipolar Oxides

  • Author

    Chen, X.J. ; Barnaby, H.J. ; Vermeire, B. ; Holbert, K. ; Wright, D. ; Pease, R.L. ; Dunham, G. ; Platteter, D.G. ; Seiler, J. ; McClure, S. ; Adell, P.

  • Author_Institution
    Arizona State Univ., Tempe
  • Volume
    54
  • Issue
    6
  • fYear
    2007
  • Firstpage
    1913
  • Lastpage
    1919
  • Abstract
    Bipolar junction test structures packaged in hermetically sealed packages with excess molecular hydrogen (H2) showed enhanced degradation after radiation exposure. Using chemical kinetics, we propose a model that quantitatively establishes the relationship between excess H2 and radiation-induced interface trap formation. Using environments with different molecular hydrogen concentrations, radiation experiments were performed and the experimental data showed excellent agreement with the proposed model. The results, both experimentally and theoretically, showed increased radiation induced degradation with H2 concentration, and device degradation saturate at both high and low ends of H2 concentrations.
  • Keywords
    bipolar transistors; hydrogen neutral molecules; radiation effects; H2; bipolar junction test structures; bipolar oxides; chemical kinetics; excess molecular hydrogen; gated bipolar devices; hermetically sealed packages; radiation exposure; radiation-induced degradation; radiation-induced interface trap formation; Degradation; Electron traps; FETs; Hermetic seals; Hydrogen; Laboratories; MOSFETs; Packaging; Propulsion; Silicon devices; Bipolar oxide; gated bipolar devices; hydrogen; interface traps; radiation-induced;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.2007.909708
  • Filename
    4395094