DocumentCode
996992
Title
Mechanisms of Enhanced Radiation-Induced Degradation Due to Excess Molecular Hydrogen in Bipolar Oxides
Author
Chen, X.J. ; Barnaby, H.J. ; Vermeire, B. ; Holbert, K. ; Wright, D. ; Pease, R.L. ; Dunham, G. ; Platteter, D.G. ; Seiler, J. ; McClure, S. ; Adell, P.
Author_Institution
Arizona State Univ., Tempe
Volume
54
Issue
6
fYear
2007
Firstpage
1913
Lastpage
1919
Abstract
Bipolar junction test structures packaged in hermetically sealed packages with excess molecular hydrogen (H2) showed enhanced degradation after radiation exposure. Using chemical kinetics, we propose a model that quantitatively establishes the relationship between excess H2 and radiation-induced interface trap formation. Using environments with different molecular hydrogen concentrations, radiation experiments were performed and the experimental data showed excellent agreement with the proposed model. The results, both experimentally and theoretically, showed increased radiation induced degradation with H2 concentration, and device degradation saturate at both high and low ends of H2 concentrations.
Keywords
bipolar transistors; hydrogen neutral molecules; radiation effects; H2; bipolar junction test structures; bipolar oxides; chemical kinetics; excess molecular hydrogen; gated bipolar devices; hermetically sealed packages; radiation exposure; radiation-induced degradation; radiation-induced interface trap formation; Degradation; Electron traps; FETs; Hermetic seals; Hydrogen; Laboratories; MOSFETs; Packaging; Propulsion; Silicon devices; Bipolar oxide; gated bipolar devices; hydrogen; interface traps; radiation-induced;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.2007.909708
Filename
4395094
Link To Document