Title :
OH-ion distribution profiles in rod preforms of high-silica optical waveguide
Author :
Kawachi, M. ; Horiguchi, M. ; Kawana, A. ; Miyashita, Tadakazu
Author_Institution :
NTT Ibaraki Electrical Communication Laboratory, Tokai, Japan
Abstract :
To investigate the OH-contamination mechanism in high-silica optical waveguide, we have measured optically OH-ion distribution profiles in rod preforms prepared by the c.v.d. technique. The contamination due to OH diffusion from the supporting silica tube was clarified in relation to the deposited barrier-glass-layer thickness.
Keywords :
optical waveguides; OH ion distribution profile; contamination mechanism; high silica optical waveguides; rod preforms;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:19770179
