DocumentCode :
999068
Title :
New structure of enhancement-mode GaAs microwave m.o.s.f.e.t.
Author :
Mimura, Takashi ; Odani, Kyohei ; Yokoyama, Naoki ; Fukuta, Masahiro
Author_Institution :
Fujitsu Laboratories Ltd., Kawasaki, Japan
Volume :
14
Issue :
16
fYear :
1978
Firstpage :
500
Lastpage :
502
Abstract :
This letter proposes a new feasible device structure of an enhancement-mode GaAs deep-depletion m.o.s.f.e.t. as an attractive alternative to the junction-gate f.e.t.s and describes its microwave properties. The device has been fabricated on a high-resistance epitaxial n¿-layer by simple readily available technology without requiring the sophisticated control of the channel thickness needed for the conventional junction-gate f.e.t.s. The ´normally-off nature of the device can be explained on the basis of the substrate space-charge region extending over then¿-layer. The microwave performance of the device can be favourably compared with that of currently achievable junction-gate normally-off f.e.t.s. Unilateral gain drops to zero at a frequency slightly above 7 GHz.
Keywords :
III-V semiconductors; gallium arsenide; insulated gate field effect transistors; solid-state microwave devices; deep depletion MOSFET; enhancement mode GaAs microwave MOSFET; high resistivity epitaxial n- layer; microwave performance;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19780336
Filename :
4249497
Link To Document :
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