DocumentCode :
999377
Title :
Comparison of optical waveguide losses in silicon-on-insulator
Author :
Zinke, T. ; Fischer, Ulrich ; Splett, A. ; Schuppert, B. ; Petermann, K.
Author_Institution :
Inst. fur Hochfrequenztech., Tech. Univ. Berlin, Germany
Volume :
29
Issue :
23
fYear :
1993
Firstpage :
2031
Lastpage :
2033
Abstract :
Waveguide losses in SOI (silicon-on-insulator) material fabricated by different techniques are compared thus enabling one to confirm the theoretical dependence of losses on layer thickness. Single-mode waveguide losses in BE-SOI (bond and etchback-SOI) below 0.5dB/cm are reported for waveguides with cross-sections of several square micrometres.
Keywords :
elemental semiconductors; integrated optics; optical losses; optical waveguides; semiconductor-insulator boundaries; silicon; silicon compounds; Si-SiO 2; Si-SiO 2 structure; bond and etchback-SOI; integrated optics; layer thickness; optical waveguide losses; rib waveguides; silicon-on-insulator; single-mode waveguide losses; waveguides cross-sections;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19931356
Filename :
253960
Link To Document :
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