• DocumentCode
    999736
  • Title

    Offset word-line architecture for scaling DRAMs to the gigabit level

  • Author

    Scheuerlein, Roy E. ; Meindl, James D.

  • Author_Institution
    Center for Integrated Syst., Stanford Univ., CA, USA
  • Volume
    23
  • Issue
    1
  • fYear
    1988
  • Firstpage
    41
  • Lastpage
    47
  • Abstract
    An alternative to the boosted word-line DRAM architecture is described that is scalable to the gigabit level and avoids the problems of poor performance and high gate fields of conventional boosted word-line circuits. The alternative is called an offset word-line architecture, because the cell switch is changed to depletion mode and the word line is pulled beyond the cell switch device´s source voltage rather than boosted beyond its drain voltage. The large voltage swing for the word line does not cause large fields across the gate dielectric in the word-line driver or array access device because the gates of some devices use materials with modified work functions. The word-line voltage swing can be greater than the bit-line voltage swing plus the required threshold voltage even for gigabit-scale integration DRAM technologies.<>
  • Keywords
    CMOS integrated circuits; VLSI; integrated memory circuits; random-access storage; CMOS IC; DRAM; VLSI; depletion mode; dynamic RAM; gigabit-scale integration; memory circuits; offset word-line architecture; source voltage; word-line voltage swing; Boosting; Capacitors; Circuits; Delay; Dielectric devices; Dielectric materials; Random access memory; Signal restoration; Switches; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/4.254
  • Filename
    254