DocumentCode
999784
Title
Rethinking X-ray lithography
Author
Zorpette, Glenn
Volume
29
Issue
6
fYear
1992
fDate
6/1/1992 12:00:00 AM
Firstpage
33
Lastpage
36
Abstract
A viable alternative to synchrotron-based fabrication lines is discussed. These are collimated point X-ray sources that will cost a fraction of the price of synchrotrons. The two basic configurations for X-ray lithography-proximity and projection-are explained. Two basic methods for collimating the sources are described, and the advantages and disadvantages of each are examined.<>
Keywords
X-ray lithography; X-ray lithography; collimated point X-ray sources; collimation methods; projection lithography; proximity lithography; Circuits; Costs; Electromagnetic radiation; Fabrication; Laboratories; Optical collimators; Optical devices; Resists; Synchrotrons; X-ray lithography;
fLanguage
English
Journal_Title
Spectrum, IEEE
Publisher
ieee
ISSN
0018-9235
Type
jour
DOI
10.1109/6.254017
Filename
254017
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